Extension of 193nm Lithography by Chemical Shrink Process
نویسندگان
چکیده
منابع مشابه
25nm Immersion Lithography at a 193nm Wavelength
The physical limitations of lithographic imaging are ultimately imposed by the refractive indices of the materials involved. At oblique collection angles, the numerical aperture of an optical system is determined by nsin(θ) , where n is the lowest material refractive index (in the absence of any refractive power through curvature). For 193nm water immersion lithography, the fluid is the limitin...
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ژورنال
عنوان ژورنال: Journal of Photopolymer Science and Technology
سال: 2016
ISSN: 0914-9244,1349-6336
DOI: 10.2494/photopolymer.29.761